Physical Vapor Transport Systems (PVT)

They are characterized by:

  • Developed for mass production
  • Can also be configured as a development system with maximum variability - individualization possible
  • Small footprint
  • High repeat accuracy
  • High quality standard for maximum yield
  • Prepared for full automation on the store floor
  • Connection to SECS / GEM
  • Always in good contact with our PVA Crystal Growing Systems experts

The so-called Physical Vapor Transport (PVT) process has been firmly established for many years as the standard method for the production of SiC bulk material. In this process, the raw material, e.g. SiC powder, is transferred (sublimated) directly from the solid to the gaseous aggregate state at high temperatures of over 2000°C and then deposited on a seedling. In this way, the seedling grows in thickness to form a monocrystalline boule.

Silicon carbide is particularly suitable for end applications in which high currents need to be switched with as little loss as possible. The components made from silicon carbide wafers work very efficiently. This is ensured by the lower power loss and higher thermal conductivity of the circuits produced in this way. It is therefore not surprising that this material is used for high packing and power densities and where active cooling is expensive.

SiC is the ideal basis for applications in power electronics up to the kV range, as it enables high switching voltages.

With its SiCma product group, PVA Crystal Growing Systems GmbH has been building and developing one of the most successful, commercially freely available PVT systems for the production of SiC single crystals for over ten years.

Continuous further development and intensive cooperation with partners from industry and science ensure that PVT systems grow in line with our customers' requirements. Through targeted further development, we ensure that our customers can continue to assert themselves in international competition in the future.

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How can we help you with PVT systems?

cgsinfo(at)pvatepla.com

SiCma system - developed for the production of silicon carbide

  • SiCma System

    The SiCma ("Silicon Carbide machine") was developed for the production of SiC crystals by means of physical vapor transport (PVT). The raw material, e.g. SiC powder, is transferred (sublimated) directly from the solid to the gaseous aggregate state at high temperatures of over 2000°C and then deposited on a seedling. The seedling grows in thickness to form a monocrystalline boule.The design is optimized for low energy consumption.

    The possible size of the substrate is 150 to 200 mm in diameter (6'' - 8''). The high degree of automation and the compact footprint of the system are perfect for use in mass production. A mobile system is used for loading and unloading.  Numerous options are available that can be added on a modular basis - for example vacuum pumps and measuring devices.

    Product data at a glance:

    Typical crystal diameters:: 6“ and 8“
    ID small quartz tube: Ø 378 mm
    ID large quartz tube: Ø 430 mm
    Frequency: 6 - 10 kHz
    Cabinet Footprint [BxT] 1.200 x 2.500 mm

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PVA Crystal Growing Systems GmbH
Im Westpark 10 – 12
35435 Wettenberg

Phone: +49 (0) 641/68690-0

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PVA Crystal Growing Systems GmbH
Im Westpark 10 – 12
35435 Wettenberg

Phone: +49 (0) 641/68690-0