Float Zone Systems

  • FZ-14

    The FZ-14 Float-Zone crystal-growing system is designed for the industrial production of monocrystalline Silicon crystals with a diameter of up to 100 mm (4"). Depending on the dimensions of the source rod, crystals with a length of up to 1.1 m can be pulled. The crystal diameter and height of the liquid zone during the process can be monitored using a camera. Both the upper spindle and the coil are positioned automatically. The contactless melting process—the high final vacuum generated through the use of a turbomolecular pump and ultra-pure Argon as a process atmosphere—effectively prevents contamination during the process. The system also allows Nitrogen to be introduced into the process chamber in a controlled manner.

    We offer a range of additional options such as a gas doping system for doping the crystals, a closed DI cooling water system, a shaper for the source rods, and a system for adjusting the orientation of the seed crystal.

    Product Data Overview

    Material: Silicon

    Crystal
    Crystal pulling length: 1,100 mm
    Crystal diameter: up to 100 mm (4″)
    Final vacuum: 2.5 x 10-5 mbar
    Max. overpressure: 0.5 bar(g)
    Generator
    Output voltage: 30 kW
    Frequency: 2.4 MHz
    Upper Spindle
    Charge rate: up to 30 mm/min
    Upper rotation: up to 35 rpm
    Lower Spindle
    Pulling rate: up to 30 mm/min
    Lower rotation: up to 30 rpm
    Dimensions
    Height: 6,280 mm
    Width:    2,750 mm
    Depth: 3,000 mm
    Weight (total):    approx. 4,900 kg
  • FZ-14M(G)

    The FZ-14M(G) Float-Zone crystal-growing system is designed for preparing samples of monocrystalline Silicon crystals for material analysis in industrial Polysilicon production. Small polycrystalline samples from the production process are inductively melted in an Argon atmosphere and crystallize on a seed crystal to form a single crystal, which then undergoes a spectrometric analysis to determine and document the quality of the Polysilicon produced. The contactless melting process—the high final vacuum generated through the use of a turbomolecular pump and ultra-pure Argon as a process atmosphere—effectively prevents contamination during the process.

    The FZ-14M(G) allows granulate to be placed under the coil and small single crystals for material analysis to be pulled with the help of a seed crystal at the upper feed in a process with the opposite pulling direction. In addition, the upper spindle can be moved in either the X or Y direction.

    Product Data Overview

    Material: Silicon

    Crystal
    Crystal pulling length: 350 mm
    Crystal diameter: up to 25 mm
    Final vacuum: 2.5 x 10-5 mbar
    Max. overpressure: 2 bar(g)
    Generator
    Output voltage: 15 kW
    Frequency: 2.4 MHz (FZ-14M)
    Upper Spindle
    Charge rate: up to 30 mm/min
    Upper rotation: up to 30 rpm
    Lower Spindle
    Pulling rate: up to 30 mm/min
    Lower rotation: up to 30 rpm
    Dimensions
    Height: 3,000 mm
    Width:    1,020 mm
    Depth: 1,640 mm
    Footprint (total): 1,800 mm x 4,000 mm
    Weight (total):    approx. 2,500 kg
  • FZ-30 / FZ-35

    The FZ-30 and FZ-35 Float-Zone crystal-growing systems are designed for the industrial production of monocrystalline Silicon crystals with a diameter of up to 200 mm (8"). Depending on the dimensions of the source rods, crystals with a length of up to 2,000 mm can be pulled. The crystal diameter and height of the liquid zone during the process can be monitored using a camera. The contactless melting process—the high final vacuum generated through the use of a turbomolecular pump and ultra-pure Argon as a process atmosphere—effectively prevents contamination during the process.

    To cultivate large crystals, an Argon atmosphere can be generated with an overpressure of up to 3 bar in the FZ-30 and up to 5 bar in the FZ-35. Both the upper spindle and the coil can be positioned automatically. In the FZ-30, the upper spindle can be moved in either the X or Y direction. Both system types also allow Nitrogen to be introduced into the process chamber in a controlled manner. We offer a range of additional options such as a gas doping system for doping the crystals, a closed DI cooling water system, a shaper for the source rods, and a system for adjusting the orientation of the seed crystal.

    Product Data Overview

    Material: Silicon

    Crystal
    Crystal pulling length: 2,700 mm
    Crystal diameter: up to 200 mm (8")
    Final vacuum: 2.5 x 10-5 mbar
    Max. overpressure: FZ-30: 3.0 bar(g)
    FZ-35: 5.0 bar(g)
    Generator
    Output voltage: 120 kW
    Frequency: 2.4 MHz
    Upper Spindle
    Charge rate: up to 30 mm/min
    Upper rotation:    up to 30 rpm
    Lower Spindle
    Pulling rate: up to 30 mm/min
    Lower rotation: up to 30 rpm
    Dimensions
    Height: 11,550 mm
    Width: 3,800 mm
    Depth: 4,050 mm
    Footprint (total): 5,000 x 6,000 mm
    Weight (total):    approx. 14,000 kg
  • SR110

    The SR110 slim-rod puller works like a Float-Zone system. This system uses a polycrystalline Silicon rod (source rod), with a diameter of 100 mm under the high-frequency induction coil. Depending on the length of the Silicon rod, a specific number of slim rods can be generated in a multi-pulling process; these are then used as filaments in downstream Siemens processes. An isolation valve separates the receiving chamber from the process chamber, which means that the finished slim rods can be removed and the next process started immediately. The slim rods can also be doped through the introduction of process gases that diffuse into the melt.

    A modified slim-rod puller design uses two source rods with a diameter of around 50 mm, from each of which slim rods are pulled.

    Product Data Overview

    Material: Silicon

    Slim Rod
    Length:     up to 3,200 mm
    Diameter: approx. 8 mm
    Source Rod
    Length: up to 1,000 mm
    Diameter: 100 mm (4")
    Final vacuum: 5 x 10-2 mbar
    Max. overpressure: 0.35 bar(g)

    Generator
    Output voltage: 30 kW
    Frequency: 2.8 MHz
    Upper Pulling Feed
    Pulling rate: up to 60 mm/min
    Lower Pulling Feed
    Pulling rate: up to 10 mm/min
    Rotation: up to 20 rpm

    Dimensions
    Height: 7,300 mm
    Width: 1,820 mm
    Depth: 1,250 mm
    Footprint (total): 2,500 mm x 2,800 mm
    Weight (total): approx. 6,000 kg

Immediate Contact

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PVA Crystal Growing Systems GmbH
Im Westpark 10 – 12
35435 Wettenberg

Phone: +49 (0) 641/68690-0